作者单位
摘要
1 中国科学院上海光学精密机械研究所高功率激光物理重点实验室,上海 201800
2 中国科学院大学材料与光电研究中心,北京 100049
采用溶胶凝胶法制备得到以正丙醇锆和正硅酸乙酯为前驱体的ZrO2和SiO2溶胶,通过TFCalc光学薄膜软件模拟了ZrO2/SiO2三层“宽M型”基频二倍频减反膜,并使用提拉法制备得到了该均匀膜层。三层减反膜在527 nm和1053 nm处的透过率约为99.5%,且透过率大于99%的波长范围均超过150 nm。经热处理后的膜层表面均方根粗糙度为1.34 nm,表面平整性良好;并运用1-on-1激光损伤阈值测试方法测得该减反膜的零几率激光损伤阈值达到36.8 J·cm-2(1064 nm,10.7 ns)。
材料 溶胶凝胶 减反膜 ZrO2/SiO2 双波长 
光学学报
2023, 43(11): 1131001
Author Affiliations
Abstract
1 Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
Different post-treatment processes involving the use of ammonia and hexamethyldisilazane (HMDS) were explored for application to 351 nm third harmonic generation SiO2 antireflective (3ωSiO2 AR) coatings for high power laser systems prepared by the sol-gel method. According to experimental analysis, the 3ωSiO2 AR coatings that were successively post-treated with ammonia and HMDS at 150°C for 48 h and again heat-treated at 180°C for 2 h (N/H 150 + 180 AR) were relatively better. There were relatively fewer changes in the optical properties of the N/H 150 + 180 AR coating under a humid and polluted environment, and the increase in defect density was slow in high humidity environments. The laser-induced damage threshold of the N/H 150 + 180 AR coating reached 15.83 J/cm2 (355 nm, 6.8 ns), a value that meets the basic requirements of high power laser systems.
optical materials antireflection coatings sol-gel optics at surfaces laser damage thin films optical properties 
Chinese Optics Letters
2022, 20(1): 011601
Author Affiliations
Abstract
1 School of Automation, Beijing University of Posts and Telecommunications, Beijing 100876, China
2 School of Instrumentation Science and Opto-electronics Engineering, Beihang University, Beijing 100191, China
To balance the accuracy and efficiency in multiple-view triangulation with sequential images, a high-efficiency propagation-based incremental triangulation (INT) method, carving three-dimensional (3D) scene points by updating the incoming feature track one by one without iterations, is proposed. Based on the INT method, a more accurate iteration-limited INT method is also established with few iterations to bound the propagated errors, ensuring the accuracy of subsequent 3D reconstruction. Finally, experimental results demonstrate that the proposed methods can balance the efficiency and accuracy in different multiple-view INT situations.
multiple views 3D reconstruction incremental triangulation propagation 
Chinese Optics Letters
2021, 19(2): 021101
作者单位
摘要
中国科学院上海光学精密机械研究所高功率激光物理重点实验室, 上海 201800
以正硅酸乙酯作为前驱体,乙醇作为溶剂,氨水作为催化剂,在碱催化体系下制备了高分散的SiO2溶胶;然后采用提拉法在不同浓度的SiO2溶胶涂膜液中制备了四倍频266 nm波长增透的SiO2减反膜,并对各膜层的性能进行了测试。测试结果表明:在浓度最大的SiO2溶胶中以4.5 cm·min -1的提拉速度制备得到的四倍频SiO2减反膜的性能最优,其在266 nm处的透过率达到了99.307%,表面粗糙度为1.339 nm,且透过率稳定性优异。
材料 溶胶凝胶 减反膜 二氧化硅 四倍频 
光学学报
2020, 40(22): 2216001
作者单位
摘要
1 中国科学院上海光学精密机械研究所高功率激光物理重点实验室, 上海 201800
2 中国科学院大学材料与光电研究中心, 北京 100049
3 中国科学院上海光学精密机械研究所高功率激光单元技术研发中心, 上海 201800
以正硅酸乙酯为原料,采用溶胶-凝胶法制备SiO2溶胶,通过提拉法涂制多孔SiO2减反膜,并在多孔SiO2减反膜上涂制一层甲基三乙氧基硅烷(MTES)预聚体。通过疏水的MTES预聚体涂制在多孔SiO2减反膜上,对多孔SiO2减反膜的表面进行改性,以提高膜层的环境稳定性。经过表面改性的复合膜层的透过率峰值可达99.67%,折射率为1.231,水接触角达123.6°,在相对湿度为95%的环境中放置475 d后膜层的峰值透过率为99.09%,稳定性提高明显。膜层表面平整,激光损伤阈值约为24.5 J/cm 2
材料 薄膜 减反膜 溶胶-凝胶法 稳定性 
光学学报
2019, 39(8): 0831001
作者单位
摘要
中国科学院上海光学精密机械研究所高功率激光物理重点实验室, 上海 201800
运用溶胶改性和溶剂置换的方法制备以癸烷为溶剂的SiO2溶胶,通过单面旋涂方法在方形50 mm×50 mm×10 mm 的KDP晶体基片上制备均匀性良好的膜层。使用分光光度计测试涂膜的晶体基片,涂制三倍频及基频二倍频减反膜的KDP晶体基片在378 nm和835 nm处的透过率峰值均大于99.5%,膜层减反射效果良好。结合过滤技术及超声波清洗技术实现了膜层制备过程中的缺陷控制,将经过缺陷控制的三倍频减反膜涂制在洁净度高的熔石英陪涂片上,并在测试前进行激光(波长为355 nm,脉宽为3 ns)预处理,得到的三倍频减反膜的抗激光损伤阈值为(14.0±2.1) J·cm -2
材料 溶胶凝胶 二氧化硅 旋涂法 方形基片 缺陷控制 
激光与光电子学进展
2019, 56(14): 141602
作者单位
摘要
1 中国科学院上海光学精密机械研究所高功率激光物理重点实验室, 上海 201800
2 中国科学院大学材料与光电研究中心, 北京 100049
3 中国科学院上海光学精密机械研究所高功率激光单元技术研发中心, 上海 201800
以钛酸正丁酯、正硅酸乙酯为前驱体,在薄膜设计软件的辅助下,采用溶胶-凝胶法在K9光学玻璃上制备了λ/4-λ/2-λ/2膜系宽带减反膜。该膜层的光学性能良好,在500~900 nm波长范围内的平均透过率为99.25%,透过率增益随入射角增加而增大,斜入射光入射角从0°增至60°仍能有效覆盖钕玻璃的主吸收峰,此时平均透过率增益从7.2%增至10.2%;在150 ℃下进行热处理后,膜层具有一定的耐擦拭性能,表面均匀性良好,均方根粗糙度为4.00 nm。
材料 溶胶-凝胶法 减反膜 膜层设计 薄膜 
中国激光
2019, 46(7): 0703001
Author Affiliations
Abstract
1 Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
3 Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
A λ/4λ/4 broadband antireflective (AR) coating is developed with a sol-gel dip-coating method. By adding SAR-5 organosilicon resin into a base-catalyzed silica sol top layer and treating at 300°C, a broadband AR coating used for blast shields with a high average transmission of 99.34% (450–950 nm) and good hydrophobicity (with a water-contact angle of 119°) was obtained. After being subjected to rubbing 50 times and being maintained at a relative humidity of around 95% for 50 days, the average transmission of the coating decreased by 0.29% and 0.04%, respectively. This indicates that the organically modified silica (ORMOSIL) broadband AR coating has good abrasion resistance and humidity stability.
310.1210 Antireflection coatings 160.6060 Solgel 310.4165 Multilayer design 
Chinese Optics Letters
2019, 17(3): 033101
Huai Xiong 1,2,†Bin Shen 1Zhiya Chen 1Xu Zhang 1[ ... ]Lili Hu 3
Author Affiliations
Abstract
1 Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
3 The Research and Development Center for High Power Laser Glass, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
A type of $\unicode[STIX]{x1D706}/4$$\unicode[STIX]{x1D706}/4$ ultra-broadband antireflective coating has been developed using modified low refractive silica and high refractive silica layers by a sol–gel dip coating method for amplifier blast shields of the Shen Guang II high power laser facility (SG-II facility). Deposition of the first layer (high refractive index silica) involves baking at $200\,^{\circ }\text{C}$ in the post-treatment step. The second layer (low refractive index, $n=1.20$) uses low refractive index silica sol modified by acid catalysis. Thermal baking at temperatures no less than $500\,^{\circ }\text{C}$ for 60 min offers chemical stability, ethanol scratch resistance, and resistance to washing with water. The average residual reflection of dual-side-coated fused silica glass was less than 1% in the spectral range from 450 to 950 nm. Transmission gain has been evaluated by taking into account angular light, and the results show that the transmission gain increases with increasing light incidence. Even at $60^{\circ }$, the transmission spectrum of the broadband antireflective coating effectively covered the main absorption peak of Nd:glass.
amplifier antireflective coating blast shields sol–gel ultra-broadband 
High Power Laser Science and Engineering
2017, 5(4): 04000e29
Author Affiliations
Abstract
Key Laboratory of High Power and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
A study on low-refractive-index SiO2 antireflective (AR) coatings by a sol-gel method is reported. Variations in the properties of the coatings are related to the molar ratios of ammonia to deionized water being changed in the process of preparing the sols. From the performance test results, the optimal ratio of the reactants necessary to prepare low-refractive-index SiO2 AR coatings is determined. Of all the SiO2 AR coatings, the lowest recorded refractive index is 1.16 at a wavelength of 700 nm. The largest water contact angle is 121.2°, and the peak transmittance is 99.95% at a wavelength of 908 nm. Furthermore, the sol used to deposit the film with the lowest refractive index is stable because of the narrow size distribution of its constituent particles.
310.1210 Antireflection coatings 310.3840 Materials and process characterization 310.6860 Thin films, optical properties 
Collection Of theses on high power laser and plasma physics
2016, 14(1): 083101

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